• +41 (0)32 926 26 06
  • info@plasmadiam.com
  • +41 (0)32 926 26 06
  • info@plasmadiam.com
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Atlas

Atlas

Unrivalled abatement performance

Atlas™ from Edwards, provides outstanding reliability, excellent powder handling and corrosion resistance, delivering abatement performance for the semiconductor, flat panel display, solar and MOCVD industries.

Atlas offers unrivalled abatement performance

Atlas abatement technology: a range of combustion gas abatement solutions – specific to your process:

  • Atlas TCS for common CVD gases (NF3/F2)
  • Atlas TPU for PFC gases (ClF3, C2F6, C3F8) in CVD processes
  • Atlas Kronis for the low-k CVD gases in next-generation processes
  • Atlas Etch for semicon etch and flat panel display processes (CF4, SF6 and high flow PFCs)
  • Atlas Helios for safe treatment of hydrogen processes in epitaxy and MOCVD
Atlas™ systems have low fuel consumption compared with previous-generation gas abatement devices. We use proven Alzeta™ inward-fired combustor technology to achieve a significantly reduced cost of ownership. With one to six inlets with a number of options, including a temperature management system (TMS), Atlas systems can treat a flow capacity of up to 1,200 slm. They are designed to be easy to use and enable more efficient maintenance.

Edwards' inward-fired combustion technology

Used by most major semiconductor manufacturers, the inward-fired combustor has become a world standard in gas abatement since 1994.

Our unique combustion technology operates with a uniform combustion temperature. This ensures very low background emissions, and the inward flow of gas prevents process material contact with the chamber walls, which minimises the blockage by solids. The exclusive composition of the combustor material ensures superior resistance to corrosion and helps to provide the Atlas with unrivalled reliability and safety.

At our state of the art environmental innovation centre, we have process tuned solutions for outstanding performance, field proven and third party verified. Abatement DRE’s typically extend beyond global and local legislation :

  • SiH4 and other Halides below TLV
  • NF3 : >99% / <TLV
  • F2 : >99% / <TLV
  • CF4 : >90%
  • Other PFCs : >99%
With an expansive install base, unparalleled global applications team and service support, we can offer the best solution designed for your process needs. Get in touch with our team and we can work together for the ultimate resolution.
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S800

Compact hard PVD
Functional Coating

  • Compact system (W3400 x D3000 x H2300mm)
  • Utilities in a single part of the unit
  • Extremely short utility commissioning
  • Fast to install

General Information

  • Technology : Arc
  • Dimensions : W3400 x D3000 x H2300 mm
  • Vacuum chamber size : W800 x D800 x H1,150 mm
  • Vacuum chamber capacity : 730 l
  • Using plasma volume : D=550 x H720
  • Target : 727×178×18 mm (3Set) - 200/400/400A
  • Turntable : D436 × H727 mm
  • Power : 3×400V/120 kW
  • Software : Industrial PC system Simple and easy diagnosis and description system Remote diagnosis through data machine or IP

Coating types

  • Standards Coating : TiN, CrN, TiCN, TiAlN, AlTiN, etc.
  • Recipes can be selected : AlCrN, TiAlSiN, AlCrTiN, DLC, etc.
  • Capacity (24H)
  • Milling cutter : D6×50 mm = 1,800×5 = 9,000 pces - D16×95 mm = 450×5= 2,250 pces
  • Insert : D20×H6 mm = 2,340×5 = 11,700 pces
  • Hobs : D80×180 mm =24×5= 120 pces

Testing Chamber

Applications : The bench top system offered allows to reach and maintain pressures equivalent to “O” meter (Atmospheric pressure) to high level such 4000 meters and beyond, inside a test chamber.

Atmospheric Pressure Simulator Chamber

  • Programmable vacuum controller

High Vacuum Pumping Stations

Vacuum Ovens bake, degas, heat, dry and anneal components for the electronics, aerospace and defence industries. Our systems come in multiple cylindrical or cubic configurations.
Plug & Pump

PLASMADIAM TURBOMOLECULAR PUMPING STATION:

  • Range of turbomolecular pump options
  • Choice of turbomolecular pump with speeds ranging from 85 to 930 ls-1
  • Choice of dry backing pumps with capacities ranging from 6 to 90 m3h-1

Vacuum Heat Treatment Furnace

Heat treatment to fix the shape of the spiral spring. The fixing heat treatment is carried out under the following conditions :
  • Between 10-7 mbar and 10-5 mbar, in an inert atmosphere
  • Temperature between 400°C and 1000°C
  • Time between 1h and 6h

Advantages of vacuum furnaces

  • Controlled heating
  • Reproducible process
  • High efficiency
  • Fasting heating & cooling
  • High Vacuum Pumping Group

Ultra High Vacuum System Bake Out

Vacuum Ovens bake, degas, heat, dry and anneal components for the electronics, aerospace and defence industries. Our systems come in multiple cylindrical or cubic configurations.

Example

  • Temperature 300 degrees
  • Vacuum level 5.10-10 mbar
  • Fully automated cycles
  • LOG recording